SECONDMENT
CHEMICAL ETCHING ONSILICA SUBSTRATES
FROM : UNIVERSITÉ DE BORDEAUX (FRANCE)TO : UNIVERSITÉ LAVAL (QUÉBEC)
FROM : JULY 2023 TO : 31 JUNE 2024
Involved Work Packages :
RESEARCHER
OBJECTIVES
- Mastery of chemical etching on silica substrates (low roughness, high resolution and aspect ratio,
creation of complex negative photonic structures) - Controlling infiltration of BGG glass and metal
TASKS
- Creation of negative structures using laser irradiation
- Physico chemical characterization of the structures
- Characterization of integrated photonic guides